Thin Film of Benzene Deposited on 304L Stainless Steel using Pulsed Microwave Plasma Enhanced Chemical Vapor Deposition

By: Elarbi Khalil , Abdulmagid Bouzed , Sana Sbeta , Chin O. Hoong , Wong C. San

Materials & Metallurgy Engineering - Faculty of Engineering - University of Tripoli

Issue: Vol 22 |First Issue | 2016

article language: English

Abstract:

Thin films have been deposited by plasma polymerization onto 304L stainlesssteel and glass substrates using pulsed microwave Plasma Enhanced Chemical VaporDeposition (PECVD) with urebenzene (C6H6) as precursor gas. The chemicalstructure andsurface properties (wettability) of the deposited thin fims werecharacterized by FourierTransform Infrared (FTIR) spetroscopy and the WaterContact Angle (WCA) measured using an ptical tensiometer respectively. The effectsof working pressure addeposition time on the chemical structure and surfacewettability of the deposited thin films were studied. The results of the FTIR analysisshowed that the structure of the film prepared frombenzene changed inwhich theC≡C absorption bands became more prominent on decreasing the working pressure. The characteristic absorption peaks of benzene film were presented more prominentlyin the sample prepared with the longer deposition time. All the treated samplesregistered reducedWCA below 90, their hydrophilic surfaces became morewettable. The deposition time had the greatest influence on the CA measured. It was observed that wettability can be adjusted by the plasma parameters, enabling the production of coatings with properties suitable for specific practical applications.